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The effects of capacitor termination to a solenoidal antenna coil on the plasma parameters, such as the plasma density, the electron temperature, the electron energy distribution function and the plasma potential, are studied in an Ar or O2/N2 gas mixture inductively coupled plasma (ICP).
When the reactance of the capacitor is half that of the antenna, there is a resonance condition where the electrostatic coupling between the antenna coil and the chamber wall is effectively suppressed. The plasma density is maximal, while the electron temperature and the plasma potential are minimal under this resonance condition.
It is then understood that the coil consumes reactive energy while the capacitor itself generates reactive energy in the circuit which is in parallel with it. The capacitor is therefore a reactive energy generator and the capacitive effect is therefore related to a capacitor equivalent energized. = C U ,so Q0 = . (C )2.U 2 = C U2(7) III.
Moreover, the effect of capacitive coupling becomes significant as the length of the antenna coil increases. It is noted that the wafer size in the semiconductor plasma process is being enlarged from 300 to 450 mm and thus, a longer antenna coil has to be installed in the plasma reactor.
Forexample,theelectrostaticcouplingleadstoanon-uniform plasma , chamber contamination by the erosion of the window material placed beneath the antenna coil, and a high plasmapotentialthatincreasesionbombardmenttothereactor wall. Moreover, the effect of capacitive coupling becomes significant as the length of the antenna coil increases.
Therefore, two conditions (10 and 90pF) are selected to compare the effect of capacitor termination on the ashing process. As indicated in figure 7, the ashing rate is enhanced to 9.1% under the resonance condition due to the enhanced radical density from the increase in the plasma density.
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The effects of capacitor termination to a solenoidal antenna coil on the plasma parameters, such as the plasma density, the electron temperature, the electron energy …
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The effects of capacitor termination to a solenoidal antenna coil on the plasma parameters, such as the plasma density, the electron temperature, the electron energy distribution function and …
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During the ICP (inductively coupled plasma) process, a very high self-bias voltage is induced along the coil, which can cause sputtering of dielectric materials covering …
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